Gallium nitride (GaN)-based light-emitting diodes (LEDs) have revolutionized the lighting industry, offering superior energy efficiency, extended operating life, and enhanced environmental sustainability over conventional lighting technologies. Recently, the push toward miniaturizing LEDs has gained momentum, driven by advancements in display devices, augmented reality, virtual reality, and other emerging technologies. However, the lack of cost-effective native substrates and high threading dislocation density in heteroepitaxial films grown on sapphire substrates remain significant obstacles to improving device performance. Additionally, Fresnel reflections at the epitaxy-substrate interface, caused by abrupt changes in refractive indices, further reduce light energy utilization.
Inspired by the compound eyes of moths, which exhibit excellent anti-reflective properties and strong light-absorption capabilities, researchers have sought to improve light utilization in LEDs. The challenge, however, lies in the rapid and precise processing of microstructures on the curved surfaces of optoelectronic devices. “Common projection lithography methods are highly sensitive to substrate shape, leading to reduced accuracy in microstructure definition on substrates with large warps or irregular shapes,” explains Professor Shengjun Zhou. “We propose a flexible nanoimprint lithography technique that enables high-throughput and high-quality processing of bionic microstructures on curved surfaces.”
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